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GB/T 24578-2024_Chinese: Test method for measuring surface metal contamination on semiconductor wafers - Total reflection X-Ray fluorescence spectroscopy (Chinese: 半导体晶片表面金属沾污的测定 全反射X射线荧光光谱法) Note/Careful: Text of PDF is in Chinese (not English). Delivery (PDF in Chinese): 2 working-hours typically, ASAP English versions: GB/T 24578-2024
